MODEL OF THE EPITAXIAL CHEMICAL VAPOR-DEPOSITION REACTOR FOR DESIGN AND PERFORMANCE OPTIMIZATION

被引：13

作者：

JUZA, J ^{[1
]}

CERMAK, J ^{[1
]}

机构：

[1] CZECHOSLOVAK ACAD SCI, INST CHEM PROC FUNDAMENTALS, CS-25068 PRAGUE, CZECHOSLOVAKIA

来源：

CHEMICAL ENGINEERING SCIENCE | 1980年 / 35卷 / 1-2期

关键词：

D O I：

10.1016/0009-2509(80)80116-3

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：429 / 436

页数：8

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