POINT-DEFECTS AND DIFFUSION MECHANISMS PERTINENT TO THE GA SUBLATTICE OF GAAS

被引:8
|
作者
TAN, TY
机构
[1] Max Planck Institute of Microstructure Physics, 02160 Halle
关键词
GALLIUM ARSENIDE; POINT DEFECTS; DIFFUSION MECHANISMS;
D O I
10.1016/0254-0584(95)01488-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
For the Ga sublattice of GaAs, the recent understanding of the impurity and self-diffusion mechanisms and the nature of the point defects responsible are discussed. Analyses of doping enhanced AlAs/GaAs superlattice disordering data and impurity diffusion data have led to the conclusion that, under thermal equilibrium and intrinsic conditions, the triply-negatively-charged Ga vacancy (V-Ga(3-)) governs Ga self-diffusion and Al-Ga interdiffusion in As-rich crystals, while the doubly-positively-charged Ga self-interstitial (I-Ga(2+)) dominates in Ga-rich crystals. When doped sufficiently, V-Ga(3-) dominates in n-type crystals, while I-Ga(2+) dominates in p-type crystals, irrespective of the crystal composition. The V-Ga(3-) species also contributes to the diffusion of the main donor species Si, while I-Ga(2+) also governs the diffusion of the main acceptor species Zn and Be via the kick-out mechanism. The thermal equilibrium concentration of V-Ga(3-) (CVGa3-) has been found to exhibit a temperature independence or even a small negative temperature dependence in that, when the temperature is lowered, Cv is either unchanged or even slightly increases. This C behavior is consistent with many outstanding experimental results.
引用
收藏
页码:245 / 252
页数:8
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