CHARACTERIZATION AND COMPARISON OF TIN LAYERS DEPOSITED BY DIFFERENT PHYSICAL VAPOR-DEPOSITION PROCESSES

Characterization of titanium nitride films prepared by the main physical vapour deposition processes, including ion plating, arc deposition and sputtering, was undertaken. Samples supplied by different coating manufacturers were submitted to comparative investigations using scanning electron microscopy observations, X-ray diffraction, microhardness and friction measurements. Before deposition, tool steel samples were heat treated and surface polished under identical conditions. Differences exhibited by the films in morphology, structure, hardness, adhesion and friction were related either to those existing between deposition mechanisms or to the parameters of the processes. In study of the friction behaviour of an aluminium alloy-titanium nitride couple in dry conditions, the magnetron-sputtered film was found to present the best result.