CHARACTERIZATION AND COMPARISON OF TIN LAYERS DEPOSITED BY DIFFERENT PHYSICAL VAPOR-DEPOSITION PROCESSES

被引：20

作者：

BENMALEK, M ^{[1
]}

GIMENEZ, P ^{[1
]}

PEYRE, JP ^{[1
]}

TOURNIER, C ^{[1
]}

机构：

[1] CTR ETUD TECH IND MECAN,F-60300 SENLIS,FRANCE

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 48卷 / 03期

关键词：

D O I：

10.1016/0257-8972(91)90001-D

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Characterization of titanium nitride films prepared by the main physical vapour deposition processes, including ion plating, arc deposition and sputtering, was undertaken. Samples supplied by different coating manufacturers were submitted to comparative investigations using scanning electron microscopy observations, X-ray diffraction, microhardness and friction measurements. Before deposition, tool steel samples were heat treated and surface polished under identical conditions. Differences exhibited by the films in morphology, structure, hardness, adhesion and friction were related either to those existing between deposition mechanisms or to the parameters of the processes. In study of the friction behaviour of an aluminium alloy-titanium nitride couple in dry conditions, the magnetron-sputtered film was found to present the best result.

引用

页码：181 / 187

页数：7

共 14 条

[1] STRUCTURE AND PROPERTIES OF THIN-FILMS OF AMORPHOUS ALUMINUM BASED ALLOYS PREPARED BY SPUTTERING [J].