A MINIATURE X-RAY COMPATIBLE SPUTTERING SYSTEM FOR STUDYING INSITU HIGH-TC THIN-FILM GROWTH

被引：21

作者：

ZHENG, JQ ^{[1
]}

SHIH, MC ^{[1
]}

WANG, XK ^{[1
]}

WILLIAMS, S ^{[1
]}

DUTTA, P ^{[1
]}

CHANG, RPH ^{[1
]}

KETTERSON, JB ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,MAT RES CTR,EVANSTON,IL 60208

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.577112

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high T(c) oxide films. The geometry is compatible with the in-plane and conventional theta-2-theta diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

引用

页码：128 / 132

页数：5

共 12 条

[1]

EOM CB, 1989, APPL PHYS LETT, V55, pE95

[2]

Itozaki H., 1989, Advances in Superconductivity. Proceedings of the 1st International Symposium on Superconductivity, P599

[3] EPITAXIAL-FILMS OF YBA2CU3O7-DELTA ON NDGAO3, LAGAO3, AND SRTIO3 SUBSTRATES DEPOSITED BY LASER ABLATION [J].