RESONANT 3RD-HARMONIC GENERATION OF ARF LASER IN H-2-GAS AND KR-GAS JETS AT 64 NM

被引：6

作者：

HIRAKAWA, Y ^{[1
]}

OKADA, T ^{[1
]}

MAEDA, M ^{[1
]}

MURAOKA, K ^{[1
]}

机构：

[1] KYUSHU UNIV,DEPT ENERGY CONVERS,KASUGA,FUKUOKA 816,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 06期

关键词：

Excimer laser; Extreme ultraviolet; Four-wave mixing; Nonlinear optics; Third-harmonic generation;

D O I：

10.1143/JJAP.29.L958

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Two-photon resonant third-harmonic generation (THG) in H2 and Kr gas jets at 64 nm was investigated by using a tunable ArF excimer laser. It was found that the THG efficiency of H2 was more than one order of magnitude higher than that of Kr. This technique will be useful in extending the tunable XUV range down to 66 nm by four-wave mixing with a dye laser. © 1990 The Japan Society of Applied Physics.

引用

页码：L958 / L960

页数：3

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