CHARACTERIZATION OF ION-IMPLANTED WAVE-GUIDES IN ND-YAG

被引:41
作者
ZHANG, L [1 ]
CHANDLER, PJ [1 ]
TOWNSEND, PD [1 ]
FIELD, SJ [1 ]
HANNA, DC [1 ]
SHEPHERD, DP [1 ]
TROPPER, AC [1 ]
机构
[1] UNIV SOUTHAMPTON,DEPT PHYS,SOUTHAMPTON SO9 5NH,HANTS,ENGLAND
关键词
D O I
10.1063/1.348962
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ion implantation into Nd:YAG has been used to produce waveguides which are capable of supporting laser action. The refractive index profiles have been characterized as a function of ion dose and energy, implant temperature, and subsequent thermal annealing. Transmission losses down to 1.2 dB/cm have been obtained in the optimized waveguides. There is a temperature independent index enhancement of approximately 0.15% in the electronic stopping (guiding) region. The nuclear collision damage is temperature dependent, and shows an initial index increase (approximately 0.3% for dose 1 X 10(16) ions/cm2), but a subsequent decrease of up to several percent, which forms an optical barrier, as has been observed in many other crystalline materials. The best mode confinement and attenuation is obtained by utilizing the low dose nuclear index enhancement produced by several equally spaced implants (multiple energy) to give a broad well with DELTA-n approximately 0.25%. Several unusual features of the profiles are reported and discussed.
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页码:3440 / 3446
页数:7
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