DYNAMIC THERMAL DISTORTIONS IN AN X-RAY MASK MEMBRANE DURING PULSED X-RAY-EXPOSURE

被引:7
作者
CHIBA, A
OKADA, K
机构
[1] Sortec Corporation, Tsukuba-Shi, Ibaraki
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 11期
关键词
DYNAMIC THERMAL DISTORTION; X-RAY MASK MEMBRANE; PULSED X-RAY EXPOSURE; MASK HEATING; ELASTIC WAVE; SIN MASK; X-RAY LITHOGRAPHY;
D O I
10.1143/JJAP.29.2610
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dynamic thermal distortion for an X-ray mask membrane has been numerically studied with special reference to the effect of elastic waves on its distortion behavior during pulsed X-ray exposure. A partial differential equation governing the dynamic behavior is derived by combining the theory of plane stress and the principle of Hamilton. The calculations based on an implicit finite difference method are performed for a SiN membrane under a 1-bar helium gas environment. Thermal displacement caused by a pulsed X-ray extends in the form of an elastic wave from a terminated rim toward a center. Critical pulse duration is offered in which the displacement in an exposure field does not occur during pulsed X-ray exposure. The peak displacement takes place with a time lag after a pulse exposure.
引用
收藏
页码:2610 / 2615
页数:6
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