STRUCTURES AND PHYSICAL-PROPERTIES OF SPUTTERED AMORPHOUS SIC FILMS

被引：17

|

作者：

MATSUNAMI, H

MASAHIRO, H

TANAKA, T

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1979年 / 8卷 / 03期

关键词：

D O I：

10.1007/BF02655626

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：249 / 260

页数：12

相关论文

共 50 条

[1] SOME PHYSICAL-PROPERTIES OF ZNO SPUTTERED FILMS
CROITORU, N
SEIDMAN, A
YASSIN, K
THIN SOLID FILMS, 1987, 150 (2-3) : 291 - 301
[2] PHYSICAL-PROPERTIES OF SPUTTERED CHALCOGENIDE FILMS WITH A VARIABLE CONTENT OF IRON
BORNSTEIN, A
CROITORU, N
LEREAH, Y
LEWIN, I
THIN SOLID FILMS, 1982, 90 (02) : 167 - 167
[3] PHYSICAL-PROPERTIES OF SPUTTERED CHALCOGENIDE FILMS WITH A VARIABLE CONTENT OF FE
BORNSTEIN, A
LEWIN, I
LEREAH, Y
CROITORU, N
APPLIED PHYSICS LETTERS, 1982, 41 (09) : 866 - 868
[4] MICROSTRUCTURE AND PHYSICAL-PROPERTIES OF AMORPHOUS HYDROGENATED SILICON FILMS
MEZDROGINA, MM
BARDAMID, AF
GOLIKOVA, OA
KAZANIN, MM
KUDOYAROVA, VK
SOROKINA, KL
INORGANIC MATERIALS, 1990, 26 (09) : 1547 - 1551
[5] PHYSICAL-PROPERTIES AND MICROSTRUCTURE OF AMORPHOUS HYDROGENATED SILICON FILMS
MEZDROGINA, MM
KUDOYAROVA, VK
BARDAMID, AF
NOVOSELSKAYA, AI
INORGANIC MATERIALS, 1987, 23 (06) : 786 - 790
[6] PREPARATION AND PHYSICAL-PROPERTIES OF RADIOFREQUENCY-SPUTTERED AMORPHOUS FILMS IN THE SYSTEM ALPO4-TIO2
HANADA, T
KATO, Y
TANABE, S
SOGA, N
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1992, 75 (09) : 2335 - 2338
[7] PHYSICAL-PROPERTIES AND STRUCTURE OF RF-SPUTTERED AMORPHOUS FILMS IN THE SYSTEM TIO2-SIO2
HANADA, T
AIKAWA, T
SOGA, N
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1984, 67 (01) : 52 - 56
[8] INFLUENCE OF THE HYDROGEN CONTENT ON THE PHYSICAL-PROPERTIES OF MAGNETRON SPUTTERED AMORPHOUS-SILICON
DEMICHELIS, F
MEZZETTI, E
RAVA, P
TAGLIAFERRO, A
TRESSO, E
DELLAMEA, GA
MAZZOLDI, P
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1985, 77-8 : 269 - 272
[9] PREPARATION AND PHYSICAL-PROPERTIES OF RF-SPUTTERED AMORPHOUS FILMS IN THE AL2O3-AIN SYSTEM
HANADA, T
KOBAYASHI, M
TANABE, S
SOGA, N
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 135 (2-3) : 227 - 235
[10] OPTICAL AND PHYSICAL-PROPERTIES OF SPUTTERED SI-AL-O-N FILMS
KNOLL, RW
HENAGER, CH
JOURNAL OF MATERIALS RESEARCH, 1992, 7 (05) : 1247 - 1252

← 1 2 3 4 5 →