BEHAVIOR OF IONS IN SIO2

被引：9
作者：
WILLIAMS, R [1 ]
机构：
[1] RCA LABS,PRINCETON,NJ 08540
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期
关键词：
D O I：
10.1116/1.1318675
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1025 / 1027
页数：3
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