Structural, Morphological and Optical Properties o f Aluminium Doped ZnO Thin Film by Dip-Coating Method

被引：19

作者：

Anandh, Ba ^{[1
]}

Ganesh, A. Shankar ^{[1
]}

Thangarasu, R. ^{[2
]}

Rsakthivel ^{[1
]}

Kannusamy, R. ^{[1
]}

Tamilselvan, K. ^{[1
]}

机构：

[1] PSG Coll Arts & Sci, Dept Elect, Coimbatore 14, Tamil Nadu, India

[2] PSG Coll Arts & Sci, Dept Phys, Coimbatore 14, Tamil Nadu, India

来源：

ORIENTAL JOURNAL OF CHEMISTRY | 2018年 / 34卷 / 03期

关键词：

Thin film; Aluminium doped ZnO; Dip coating; X-ray diffraction (XRD); Field Emission Scanning Electron Microscope (FESEM); UV-Vis. Spectroscopy (UV); Photoluminescence spectroscopy (PL);

D O I：

10.13005/ojc/340356

中图分类号：

Q5 [生物化学]; Q7 [分子生物学];

学科分类号：

071010 ; 081704 ;

摘要：

Dip coating method is used for depositing Aluminium (Al) doped Zinc Oxide (ZnO) thin films on glass substrate. Undoped, 1%, 3% and 5% Al doped ZnO thin films are prepared and their structural, morphological and optical properties are studied. X-ray diffraction study confirms that films are polycrystalline with hexagonal arrangement. Field Emission Scanning Electron Microscope (FESEM) is used to analyze the surface morphology and it shows the spherical like structure. Energy Dispersive X-ray Analysis (EDX) pattern shows the presence of Zn, O and Al. UV-Vis. Spectroscopy and Photoluminescence spectroscopy (PLS) are used to study optical properties. Optical study indicates that both undoped and Aluminium doped ZnO films are transparent in UV region and closer to visible region. The band gaps of the films are 3.55eV, 3.68eV, 3.82eV and 3.25eV for undoped, 1%, 3% and 5% Aluminium doped ZnO films correspondingly.

引用

页码：1619 / 1624

页数：6

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