SPUTTERING AND DEPTH-DISTRIBUTION PHENOMENA IN KCL AL2O3 AND TIO2

被引:22
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KELLY, R
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10.1139/p68-060
中图分类号
O4 [物理学];
学科分类号
0702 ;
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页码:473 / &
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[1]  
AKISHIN AI, 1962, B ACAD SCI USSR P, V26, P1379
[2]   COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J].
ALMEN, O ;
BRUCE, G .
NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02) :257-278
[3]   CESIUM ION SPUTTERING OF ALUMINUM [J].
ANDREWS, AE ;
HASSELTINE, EH ;
OLSON, NT ;
SMITH, HP .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) :3344-+
[4]   EFFECT OF ENERGY AND INTEGRATED FLUX ON RETENTION AND RANGE OF INERT GAS IONS INJECTED AT KEV ENERGIES IN METALS [J].
BROWN, F ;
DAVIES, JA .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (06) :844-&
[5]   EFFECT OF ELEVATED TEMPERATURES ON SPUTTERING YIELDS [J].
CARLSTON, CE ;
MAGNUSON, GD ;
COMEAUX, A ;
MAHADEVAN, P .
PHYSICAL REVIEW, 1965, 138 (3A) :A759-+
[6]  
COLLIGON JS, 1962, 8 T VAC S, P275
[7]   CESIUM ION SPUTTERING OF ALUMINUM COPPER AND TITANIUM [J].
DALEY, HL ;
PEREL, J .
AIAA JOURNAL, 1967, 5 (01) :113-&
[8]   EQUIVALENT DC SPUTTERING YIELDS OF INSULATORS [J].
DAVIDSE, PD ;
MAISSEL, LI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (01) :33-&
[9]   RANGE OF XE133 AND AR41 IONS OF KILOELECTRON VOLT ENERGIES IN ALUMINUM [J].
DAVIES, JA ;
BROWN, F ;
MCCARGO, M .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (06) :829-&
[10]   RANGE OF ENERGETIC XE125 IONS IN MONOCRYSTALLINE SILICON [J].
DAVIES, JA ;
BROWN, F ;
BALL, GC ;
DOMEIJ, B .
CANADIAN JOURNAL OF PHYSICS, 1964, 42 (06) :1070-&