OXYGEN IMPURITY EFFECTS AT METAL-SILICIDE INTERFACES - FORMATION OF SILICON-OXIDE AND SUBOXIDES IN THE NI-SI SYSTEM

被引：53
作者：
GRUNTHANER, PJ
GRUNTHANER, FJ
SCOTT, DM
NICOLET, MA
MAYER, JW
机构：
[1] CALTECH,PASADENA,CA 91125
[2] CORNELL UNIV,ITHACA,NY 14853
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期
关键词：
D O I：
10.1116/1.571078
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：641 / 648
页数：8
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