IMPURITY-DEFECT INTERACTION IN GALLIUM-ARSENIDE DOPED BY IMPLANTATION OF TELLURIUM IONS

被引:0
作者
ZELEVINSKAYA, VM [1 ]
KACHURIN, GA [1 ]
SMIRNOV, LS [1 ]
机构
[1] ACAD SCI USSR, SEMICOND PHYS INST, NOVOSIBIRSK, USSR
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1973年 / 6卷 / 07期
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D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
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页码:1209 / 1210
页数:2
相关论文
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    ABRAHAMS, MS
    BUIOCCHI, CJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (11) : 5139 - &
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