XPS INVESTIGATION OF THE OXIDATION OF HG1-XCDXTE SURFACES

被引：52

作者：

KOWALCZYK, SP ^{[1
]}

CHEUNG, JT ^{[1
]}

机构：

[1] ROCKWELL INT,CTR SCI,THOUSAND OAKS,CA 91360

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 03期

关键词：

D O I：

10.1116/1.570961

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：944 / 948

页数：5

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