STRUCTURAL AND ELECTRICAL-PROPERTIES OF STABLE NI/CR THIN-FILMS

被引：28
|
作者：
AU, CL
JACKSON, MA
ANDERSON, WA
机构：
[1] State Univ of New York at Buffalo,, Amherst, NY, USA, State Univ of New York at Buffalo, Amherst, NY, USA
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1987年 / 16卷 / 04期
关键词：
D O I：
10.1007/BF02653370
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
5
引用
收藏
页码：301 / 306
页数：6
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