STRUCTURAL AND ELECTRICAL-PROPERTIES OF STABLE NI/CR THIN-FILMS

被引:28
作者
AU, CL
JACKSON, MA
ANDERSON, WA
机构
[1] State Univ of New York at Buffalo,, Amherst, NY, USA, State Univ of New York at Buffalo, Amherst, NY, USA
关键词
D O I
10.1007/BF02653370
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
5
引用
收藏
页码:301 / 306
页数:6
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