EQUILIBRIUM OF CARBON AND OXYGEN IN SILICON WITH CARBON-MONOXIDE IN AMBIENT ATMOSPHERE

被引:17
作者
ENDO, Y [1 ]
YATSURUGI, Y [1 ]
TERAI, Y [1 ]
NOZAKI, T [1 ]
机构
[1] INST PHYS & CHEM RES,WAKO,SAITAMA 351,JAPAN
关键词
C and O in Si; equilibrium; semiconductor Si; SiO;
D O I
10.1149/1.2129292
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The pressure of CO in equilibrium with Si saturated with both C and O was measured by the transportation method from 1683°K (mp of Si) to about 1800°K, and was found to be as Pco = exp [-54900/T + 24.7]. This equation, when combined with the known solubilities of C and O in Si, gives the following relationship among C and O concentrations in Si ([C]si and [O]Si in ppma) and ambient CO pressure ([CO] in atm) at the mp of Si: [CO]/ ([C]si[O]si) = 9.6 × 10-8 for liquid Si and 1.1 × 10-6 for solid Si. This equilibrium constant for solid Si has been compared with the corresponding (nonequilibrium) values actually observed in our silicon factory. Also, some thermochemical constants of solid SiO were derived from the experimental result. © 1979, The Electrochemical Society, Inc. All rights reserved.
引用
收藏
页码:1422 / 1425
页数:4
相关论文
共 12 条
[1]  
Baker J. A., 1969, Semiconductor silicon, P566
[2]   THE STABILITY OF SIO SOLID AND GAS [J].
BREWER, L ;
EDWARDS, RK .
JOURNAL OF PHYSICAL CHEMISTRY, 1954, 58 (04) :351-358
[3]   INFRARED SPECTROPHOTOMETRY FOR CARBON IN SILICON AS CALIBRATED BY CHARGED-PARTICLE ACTIVATION [J].
ENDO, Y ;
AKIYAMA, N ;
NOZAKI, T ;
YATSURUG.Y .
ANALYTICAL CHEMISTRY, 1972, 44 (14) :2258-&
[4]  
HUFF HR, 1977, SEMICONDUCTOR SILICO
[5]   SILICON MONOXIDE PRESSURES DUE TO REACTION BETWEEN SOLID SILICON AND SILICA [J].
KUBASCHEWSKI, O ;
CHART, TG .
JOURNAL OF CHEMICAL THERMODYNAMICS, 1974, 6 (05) :467-476
[6]  
Kubaschewski O., 1967, METALLURGICAL THERMO
[7]   VIBRATIONAL ABSORPTION OF CARBON AND CARBON-OXYGEN COMPLEXES IN SILICON [J].
NEWMAN, RC ;
SMITH, RS .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (06) :1493-&
[8]   CONCENTRATION AND BEHAVIOR OF CARBON IN SEMICONDUCTOR SILICON [J].
NOZAKI, T ;
YATSURUGI, Y ;
AKIYAMA, N .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (12) :1566-+
[9]   CHARGED-PARTICLE ACTIVATION-ANALYSIS - STUDIES ON CARBON, NITROGEN AND OXYGEN MAINLY IN SEMICONDUCTOR SILICON [J].
NOZAKI, T ;
YATSURUGI, Y ;
ENDO, Y .
JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1976, 32 (01) :43-50
[10]   NEW RADIO-TRACER TECHNIQUE FOR EVAPORATION STUDY OF LIGHT ELEMENTS FROM MOLTEN SILICON [J].
NOZAKI, T ;
MAKIDE, Y ;
YATSURUGI, Y ;
AKIYAMA, N ;
ENDO, Y .
INTERNATIONAL JOURNAL OF APPLIED RADIATION AND ISOTOPES, 1971, 22 (10) :607-+