INTERFACIAL REACTIONS BETWEEN AL AND RUO2, MOOX AND WNX DIFFUSION-BARRIERS ON SI

被引：6

作者：

HORNSTROM, SE ^{[1
]}

CHARAI, A ^{[1
]}

THOMAS, O ^{[1
]}

KRUSINELBAUM, L ^{[1
]}

FRYER, PM ^{[1
]}

HARPER, JME ^{[1
]}

GONG, S ^{[1
]}

ROBERTSSON, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1002/sia.740140104

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：7 / 12

页数：6

共 25 条

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