Native point defect equilibria and the phase extent of gallium arsenide

被引:8
|
作者
Hurle, DTJ
机构
来源
ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4 | 1995年 / 196-卷
关键词
gallium arsenide; vacancies; donors; solidus;
D O I
10.4028/www.scientific.net/MSF.196-201.179
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It is shown that recently revised data on the equilibrium arsenic pressure over Ga:As melts resolves the discrepancy between published determinations of non-stoichiometry in GaAs, obtained from titration and density/lattice parameter measurements. By analysing data on donor solubility in crystals grown from Ga-Bi solutions, an experimental measure of the concentration of charged gallium vacancies is obtained for the first time. This model of equilibrium dopant incorporation is shown to provide a much more satisfactory description than the commonly accepted concept of incorporation controlled by a Schottky barrier at the growth interface. The deduced values of the concentrations of the dominant point defects are used to construct the GaAs solidus.
引用
收藏
页码:179 / 187
页数:9
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