1ST ADSORBED LAYER OF HELIUM AT 4.2-DEGREES-K

被引：33
作者：
HOBSON, JP
机构：
来源：
CANADIAN JOURNAL OF PHYSICS | 1959年 / 37卷 / 03期
关键词：
D O I：
10.1139/p59-034
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：300 / 312
页数：13
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共 42 条
[31]   THE ANOMALOUS MONOLAYER ADSORPTION OF HELIUM [J].
SINGH, RP ;
BAND, W .
JOURNAL OF PHYSICAL CHEMISTRY, 1955, 59 (07) :663-665
[32]   THE INTERACTION OF RARE GAS ATOMS WITH SURFACES [J].
STEELE, WA ;
HALSEY, GD .
JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (06) :979-984
[33]   HEATS OF ADSORPTION OF HYDROGEN AND HELIUM ON PREPARED SURFACES [J].
STEELE, WA ;
ASTON, JG .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1957, 79 (10) :2393-2396
[34]   CONCERNING A THEORY OF MULTILAYER ADSORPTION, WITH PARTICULAR REFERENCE TO ADSORBED HELIUM [J].
STEELE, WA .
JOURNAL OF CHEMICAL PHYSICS, 1956, 25 (05) :819-823
[35]   An experiment on the adsorption of helium gas used for thermal conduction in calorimetry near 1 degrees K - The heat of adsorption [J].
Stout, JW ;
Giauque, WF .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1938, 60 :393-395
[36]  
STRAUSS A, 1956, THESIS CHICAGO
[37]   NONCRYSTAL IONIC MODEL FOR SILICA GLASS [J].
TILTON, LW .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1957, 59 (02) :139-154
[38]   ADSORPTION OF HELIUM ON GLASS AT TEMPERATURES BELOW THE LAMBDA-TEMPERATURE [J].
TJERKSTRA, HH ;
HOOFTMAN, FJ ;
VANDENMEYDENBERG, CJN .
PHYSICA, 1953, 19 (08) :935-942
[39]   Measurements on the adsorption of helium gas on active charcoal between 4.22 degrees K and 1.78 degrees K. [J].
Van Itterbeek, A ;
Van Dingenen, W ;
Borghs, J .
PHYSICA, 1939, 6 :951-960
[40]   Absorbtion isotherms and heats of adsorbtion of helium gas on charcoal between 20(o)K and 6(o)K - New desorbtion experiments [J].
Van Itterbeek, A ;
Van Dingenen, W .
PHYSICA, 1938, 5 :529-540
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