CONTINUOUS DISCHARGE PENNING SOURCE WITH EMISSION-LINES BETWEEN 50 A AND 300 A

被引：39

作者：

FINLEY, DS

BOWYER, S

PARESCE, F

MALINA, RF

机构：

[1] University of California, Space Sciences Laboratory, Berkeley, CA

来源：

APPLIED OPTICS | 1979年 / 18卷 / 05期

关键词：

D O I：

10.1364/AO.18.000649

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have developed a modified Penning discharge lamp for use in the soft x-ray and extreme uv spectral regions. The source produces a number of intense lines in the 50–300-Å range and can be operated for substantial periods of time at high output levels before refurbishment is required. Refurbishment of this source, when required, is very easily effected. © 1979 Optical Society of America.

引用

页码：649 / 654

页数：6

共 12 条

[1]

CARTER G, 1968, ION BOMBARDMENT SOLI, P310

[2] PENNING DISCHARGE AS A SOURCE IN EXTREME ULTRAVIOLET [J].

DESLATTES, RD ;

PETERSON, TJ ;

TOMBOULIAN, DH .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (02) :302-&

[3] LOCAL INTERSTELLAR HELIUM DENSITY [J].

FREEMAN, J ;

PARESCE, F ;

BOWYER, S ;

LAMPTON, M ;

STERN, R ;

MARGON, B .

ASTROPHYSICAL JOURNAL, 1977, 215 (02) :L83-L86

[4]

HARTMAN PL, 1965, JPN J APPL PHYS, VS 4, P532

[5]

HENKE BL, 1975, ADV XRAY ANAL, V18, P76

[6]

KELLY RL, 1973, NRL7599 REP

[7] CHANNEL ELECTRON MULTIPLIER - ITS QUANTUM EFFICIENCY AT SOFT-X-RAY AND VACUUM ULTRAVIOLET WAVELENGTHS [J].

MACK, JE ;

PARESCE, F ;

BOWYER, S .

APPLIED OPTICS, 1976, 15 (04) :861-862

[8] CONTINUOUS DISCHARGE LINE SOURCE FOR EXTREME ULTRAVIOLET [J].

PARESCE, F ;

KUMAR, S ;

BOWYER, CS .

APPLIED OPTICS, 1971, 10 (08) :1904-&

[9] DISTRIBUTION OF HE+ IN PLASMASPHERE FROM OBSERVATIONS OF RESONANTLY SCATTERED HE II 304-A RADIATION [J].

PARESCE, F ;

BOWYER, CS ;

KUMAR, S .

JOURNAL OF GEOPHYSICAL RESEARCH, 1974, 79 (01) :174-178

[10]

PARESCE F, 1977, PHYSICS ASTROPHYSICS

← 1 2 →