Internal stresses in electrolytic films based on nickel and cobalt

被引：0
|
作者：
Tochitskii, TA
Boltushkin, AV
Shadrov, VG
机构：
来源：
RUSSIAN JOURNAL OF ELECTROCHEMISTRY | 1995年 / 31卷 / 12期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A mechanism of formation of internal stresses in electrolytic films based on nickel and cobalt is suggested which takes into consideration the defects of crystal lattice, crystallization pressure, and hydrogen intercalated in the deposit.
引用
收藏
页码：1299 / 1301
页数：3
相关论文
共 50 条
  • [31] INFLUENCE OF ISOTHERMAL AND THERMOCYCLIC TREATMENTS ON POROSITY AND INTERNAL-STRESSES IN NICKEL FILMS AND COATINGS
    FUKS, MY
    CHEREMSKOY, PG
    BELOZYOROV, VV
    CHUVURINA, SN
    ROSHCHENKO, ST
    FIZIKA METALLOV I METALLOVEDENIE, 1982, 53 (01): : 52 - 59
  • [32] STRUCTURE OF ELECTROLYTIC COBALT NICKEL-ALLOY DEPOSITS
    ZHIKHAREVA, IG
    ZHIKHAREV, AI
    SOVIET ELECTROCHEMISTRY, 1982, 18 (07): : 876 - 878
  • [33] Electrolytic codeposition of diamond particles with nickel and cobalt metals
    Lee, EC
    Moon, IT
    PLATING AND SURFACE FINISHING, 2002, 89 (12): : 55 - 59
  • [34] ELECTROLYTIC DEOXIDATION OF COBALT, NICKEL, COPPER, AND SILVER MELTS
    JANKE, D
    ZEITSCHRIFT FUR METALLKUNDE, 1978, 69 (05): : 302 - 307
  • [35] Internal Stresses in Nanocrystalline Nickel & Nickel-Iron Alloys
    Giallonardo, J. D.
    Erb, U.
    Palumbo, G.
    Botton, G. A.
    Andrei, C.
    THERMEC 2011, PTS 1-4, 2012, 706-709 : 1607 - +
  • [36] CHOICE OF METHODS TO MEASURE INTERNAL-STRESSES IN ELECTROLYTIC DEPOSITS
    POLUKAROV, YM
    GAMBURG, YD
    PLATONOV, BM
    SOVIET ELECTROCHEMISTRY, 1978, 14 (08): : 1090 - 1091
  • [37] ELECTROLYTIC CLADDING OF IRON-POWDER WITH COBALT AND A COBALT NICKEL-ALLOY
    KURVYAKOVA, LM
    KORNEEV, LI
    YUROV, VI
    SOVIET POWDER METALLURGY AND METAL CERAMICS, 1986, 25 (09): : 701 - 703
  • [38] STRESSES IN MONOCRYSTALLINE NICKEL FERRITE FILMS
    BASZYNSKI, J
    WARTECKI, A
    ACTA PHYSICA POLONICA A, 1976, 50 (02) : 163 - 167
  • [39] RESIDUAL STRESSES IN EVAPORATED NICKEL FILMS
    KLOKHOLM, E
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1964, 1 (02): : 77 - &
  • [40] STRESSES IN THIN NICKEL SILICIDE FILMS
    KOOS, V
    NEUMANN, HG
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1975, 29 (02): : K115 - K116
12345