STRAIN-RELAXATION IN THIN-FILMS ON SUBSTRATES

被引：37
作者：
GANGULEE, A [1 ]
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
来源：
ACTA METALLURGICA | 1974年 / 22卷 / 02期
关键词：
D O I：
10.1016/0001-6160(74)90008-X
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：177 / 183
页数：7
相关论文
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