CRITICAL-LAYER THICKNESS OF A PSEUDOMORPHIC IN0.8GA0.2AS HETEROSTRUCTURE GROWN ON INP

A very high electron mobility pseudomorphic In0.8Ga0.2As heterostructure is successfully grown on InP both by the elimination of the overshoot of flux densities and by the precise control of the flux ratio through a new calibration technique of reflection high-energy electron diffraction oscillations in a molecular beam epitaxy system. The critical-layer thickness for the pseudomorphic growth of InGaAs on InP is found to follow the energy balance model, and a very high 2DEG mobility of over 1.5 m2/V s and over 15 m2/V s at 293 and 10 K, respectively, is obtained.