THE RELATIONSHIP BETWEEN ELECTRICAL AND STRUCTURAL CHARACTERISTICS OF CDTE AND CDMNTE LAYERS GROWN ON INSB

CdTe and CdMnTe layers with thickness in the range 1-2-mu-m have been grown by MBE on (001) InSb substrates. Measurements of the free-carrier concentration as a function of depth through these layers have revealed non-unformities attributed to the presence of extended defects arising from the relief of lattice strain resulting from the epilayer-substrate lattice mismatch. Evidence for the existence of such structural non-uniformity has been provided by DCXRD rocking curve measurements. Detailed analysis of these curves also indicates the presence of a thin interfacial layer of a different phase. The use of an excess Cd flux during growth has been found to lead to increased and more uniform carrier densities in both undoped and In doped layers.