OXIDATION OF A SI(100) SURFACE BY THE ELECTRON-BEAM OF THE AUGER SPECTROMETER IN THE PRESENCE OF WATER

被引：3

作者：

VISCIDO, L

HERAS, JM

机构：

[1] Dept. of Chem., La Plata Univ.

来源：

JOURNAL OF PHYSICS-CONDENSED MATTER | 1993年 / 5卷

关键词：

D O I：

10.1088/0953-8984/5/33A/040

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

While performing Auger analysis of Si(100) surfaces covered with H2O, the electron beam induces surface oxidation only at the beam incident point, with formation of SiO. A detectable damage requires an electron dose of congruent-to 2.4 C cm-2.

引用

页码：A159 / A160

页数：2

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[3]

STRAUSSER YE, 1976, NBS40023 SPEC PUBL, P125

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