ANALYTICAL MODELING OF TRANSFER ADMITTANCE IN SMALL MOSFETS AND APPLICATION TO INTERFACE STATE CHARACTERIZATION

被引:30
作者
HADDARA, H
GHIBAUDO, G
机构
[1] CNRS, Grenoble, Fr, CNRS, Grenoble, Fr
关键词
TRANSISTORS; FIELD EFFECT - Modeling;
D O I
10.1016/0038-1101(88)90408-X
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple analytical model for the transfer admittance (dynamic transconductance) of MOS transistors is presented. This model establishes a direct correlation between the transfer admittance and the interface state admittance in an explicit analytical form. Experimental measurements have been performed and the obtained results with our theory. We present a new method for characterising interface states in MOS transistors of channel lengths less than 10 mu m from the measurement of the imaginary part of the inverse of the transfer admittance.
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页码:1077 / 1082
页数:6
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