ZN-DIFFUSION-INDUCED DAMAGE IN INSB DIODES

被引:11
作者
MOZZI, RL
LAVINE, JM
机构
关键词
D O I
10.1063/1.1658334
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:280 / &
相关论文
共 26 条
[1]   ELECTRON DENSITY DISTRIBUTION IN INDIUM ANTIMONIDE [J].
ATTARD, AE ;
AZAROFF, LV .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) :774-+
[3]  
Darwin CG, 1914, PHILOS MAG, V27, P675, DOI 10.1080/14786440408635139
[4]   The theory of X-ray reflexion. [J].
Darwin, C. G. .
PHILOSOPHICAL MAGAZINE, 1914, 27 (157-62) :315-333
[5]   INFLUENCE OF CRYSTALLOGRAPHIC DEFECTS ON DEVICE PERFORMANCE [J].
FAIRFIELD, JM ;
SCHWUTTK.GH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (11) :1229-+
[6]   PRAZISIONSBESTIMMUNG DER GITTERKONSTANTEN VON AIIIBV-VERBINDUNGEN [J].
GIESECKE, G ;
PFISTER, H .
ACTA CRYSTALLOGRAPHICA, 1958, 11 (05) :369-371
[7]   MISFIT DISLOCATIONS IN SEMICONDUCTORS [J].
HOLT, DB .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1966, 27 (6-7) :1053-+
[8]  
James R. W., 1950, OPTICAL PRINCIPLES D
[9]   DIFFUSION-INDUCED IMPERFECTIONS IN SILICON [J].
JOSHI, ML ;
WILHELM, F .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (2P1) :185-&
[10]   PROCESS-INTRODUCED STRUCTURAL DEFECTS AND JUNCTION CHARACTERISTICS IN NPN SILICON EPITAXIAL PLANAR TRANSISTORS [J].
JUNGBLUT.ED ;
WANG, P .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (06) :1967-&