STUDIES OF THE REACTION-MECHANISMS FOR THE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FROM TUNGSTEN HEXAFLUORIDE IN A PLASMA ENVIRONMENT

被引：6
作者：
WOOD, J
机构：
来源：
VACUUM | 1988年 / 38卷 / 8-10期
关键词：
D O I：
10.1016/0042-207X(88)90442-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：683 / 688
页数：6
相关论文
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