A CRITICAL-APPRAISAL OF THE LOGARITHMIC RATE LAW IN THIN-FILM FORMATION DURING OXIDATION OF COPPER AND ITS ALLOYS

被引：19
作者：
ROY, SK
SIRCAR, SC
机构：
来源：
OXIDATION OF METALS | 1981年 / 15卷 / 1-2期
关键词：
D O I：
10.1007/BF00603754
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
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页码：9 / 20
页数：12
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