TRENDS IN CHEMICAL VAPOR-DEPOSITION OF SILICON

被引：0

|

作者：

BLOEM, J ^{[1
]}

机构：

[1] PHILIPS RES LABS, EINDHOVEN, NETHERLANDS

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 03期

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D O I：

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C95 / +

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