CHARACTERIZATION OF REDOX STATES OF NICKEL-HYDROXIDE FILM ELECTRODES BY INSITU SURFACE RAMAN-SPECTROSCOPY

被引：226
作者：
DESILVESTRO, J
CORRIGAN, DA
WEAVER, MJ
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 04期
关键词：
D O I：
10.1149/1.2095818
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：885 / 892
页数：8
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