共 15 条
- [1] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 883 - 893
- [2] CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P152
- [5] APPLICATION OF A LOW-PRESSURE RADIO-FREQUENCY DISCHARGE SOURCE TO POLYSILICON GATE ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (01): : 1 - 4
- [6] ANALYSIS OF A KINEMATIC MODEL FOR ION-TRANSPORT IN RF PLASMA SHEATHS [J]. PHYSICAL REVIEW A, 1992, 45 (08): : 5913 - 5928
- [7] ION ENERGETICS IN ELECTRON-CYCLOTRON RESONANCE DISCHARGES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (05): : 3720 - 3725
- [8] ELECTROMAGNETIC-FIELDS IN A RADIOFREQUENCY INDUCTION PLASMA [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01): : 147 - 151
- [9] CHARGED-PARTICLE DENSITIES AND ENERGY-DISTRIBUTIONS IN A MULTIPOLAR ELECTRON-CYCLOTRON RESONANT PLASMA-ETCHING SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (04): : 3103 - 3112