CHEMICAL VAPOR-DEPOSITION OF TANTALUM DIBORIDE

被引：10
|
作者：
MOTOJIMA, S
SUGIYAMA, K
机构：
来源：
JOURNAL OF MATERIALS SCIENCE | 1979年 / 14卷 / 12期
关键词：
D O I：
10.1007/BF00611466
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：2859 / 2864
页数：6
相关论文
共 50 条
  • [1] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE
    TAKAHASHI, T
    KAMIYA, H
    JOURNAL OF CRYSTAL GROWTH, 1974, 26 (02) : 203 - 209
  • [2] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE
    SHIMIZU, H
    LASSAU, RT
    CIM BULLETIN, 1987, 80 (902): : 72 - 72
  • [3] CHEMICAL VAPOR-DEPOSITION OF TANTALUM DISILICIDE
    WIECZOREK, C
    THIN SOLID FILMS, 1985, 126 (3-4) : 227 - 232
  • [4] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE ON METALLIC SUBSTRATES
    VANDERVALK, HJL
    GRONDEL, JHF
    SOLID STATE IONICS, 1985, 16 (1-4) : 99 - 104
  • [5] COATING OF METALS WITH TITANIUM DIBORIDE BY CHEMICAL VAPOR-DEPOSITION
    PIERSON, HO
    RANDICH, E
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C297 - C297
  • [6] FORMATION OF TANTALUM OXIDE BY CHEMICAL VAPOR-DEPOSITION
    TAKAHASHI, T
    ITOH, H
    JOURNAL OF THE LESS-COMMON METALS, 1974, 38 (2-3): : 211 - 219
  • [7] CHEMICAL VAPOR-DEPOSITION OF TANTALUM NITRIDE FILMS
    TAKAHASHI, T
    ITOH, H
    OZEKI, S
    JOURNAL OF THE LESS-COMMON METALS, 1977, 52 (01): : 29 - 36
  • [8] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE
    ELDERS, J
    VANVOORST, JDW
    APPLIED SURFACE SCIENCE, 1992, 54 : 135 - 140
  • [9] CHEMICAL VAPOR-DEPOSITION OF NIOBIUM DIBORIDE (NBB2)
    MOTOJIMA, S
    SUGIYAMA, K
    TAKAHASHI, Y
    JOURNAL OF CRYSTAL GROWTH, 1975, 30 (02) : 233 - 239
  • [10] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE FILMS
    WILLIAMS, LM
    APPLIED PHYSICS LETTERS, 1985, 46 (01) : 43 - 45
12345