LASER-INDUCED FLUORESCENCE STUDY OF SILICON ETCHING PROCESS - DETECTION OF SIF2 AND CF2 RADICALS

[1] BRUECK SRJ, 1983, 6TH INT S PLASM CHEM, P714

[2] Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] SOME CHEMICAL ASPECTS OF THE FLUOROCARBON PLASMA ETCHING OF SILICON AND ITS COMPOUNDS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) : 33 - 41

[5] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265

[6] ROTATIONAL ANALYSIS OF ABSORPTION BANDS IN 2266 A SYSTEM OF SIF2 [J]. JOURNAL OF MOLECULAR SPECTROSCOPY, 1970, 36 (02) : 192 - &

[7] STUDIES OF CHEMI-LUMINESCENCE ACCOMPANYING FLUORINE ATOM ETCHING OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5273 - 5276

[8] OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (09) : 1265 - 1276

[9] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[10] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[1] BRUECK SRJ, 1983, 6TH INT S PLASM CHEM, P714

[2] Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] SOME CHEMICAL ASPECTS OF THE FLUOROCARBON PLASMA ETCHING OF SILICON AND ITS COMPOUNDS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) : 33 - 41

[5] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265

[6] ROTATIONAL ANALYSIS OF ABSORPTION BANDS IN 2266 A SYSTEM OF SIF2 [J]. JOURNAL OF MOLECULAR SPECTROSCOPY, 1970, 36 (02) : 192 - &

[7] STUDIES OF CHEMI-LUMINESCENCE ACCOMPANYING FLUORINE ATOM ETCHING OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5273 - 5276

[8] OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (09) : 1265 - 1276

[9] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[10] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639