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- [6] Chemical reaction during Pt etching with SF6/Ar and Cl2/Ar plasma chemistries Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2003, 42 (4 A): : 1581 - 1585
- [7] Chemical reaction during Pt etching with SF6/Ar and Cl2/Ar plasma chemistries JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (4A): : 1581 - 1585