TEMPERATURE-DEPENDENCE OF AUGER LIFETIME IN HEAVILY-DOPED HG1-XCDXTE

被引:0
作者
DE, SS
GHOSH, AK
HALDER, JC
BERA, M
HAZRA, AK
机构
[1] Centre of Advanced Study in Radio Physics and Electronics, Calcutta-700 009
关键词
D O I
10.1063/1.355106
中图分类号
O59 [应用物理学];
学科分类号
摘要
An expression for Auger lifetime as a function of temperature has been derived for a heavily doped Hg1-xCdxTe in the presence of a nonparabolicity of band structure, band gap narrowing, and carrier degeneracy. It is utilized to study the variation of Auger lifetime with temperature through numerical analysis.
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页码:6642 / 6644
页数:3
相关论文
共 33 条
[1]   AUGER-LIMITED CARRIER LIFETIMES IN HGCDTE AT HIGH EXCESS CARRIER CONCENTRATIONS [J].
BARTOLI, F ;
ALLEN, R ;
ESTEROWI.L ;
KRUER, M .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (05) :2150-2154
[2]   AUGER EFFECT IN SEMICONDUCTORS [J].
BEATTIE, AR ;
LANDSBERG, PT .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 249 (1256) :16-29
[3]   RECOMBINATION IN SEMICONDUCTORS BY A LIGHT HOLE AUGER TRANSITION [J].
BEATTIE, AR ;
SMITH, G .
PHYSICA STATUS SOLIDI, 1967, 19 (02) :577-&
[4]   AUGER RECOMBINATION IN GAAS AN GASB [J].
BENZ, G ;
CONRADT, R .
PHYSICAL REVIEW B, 1977, 16 (02) :843-855
[5]   RELAXATION OF AUGER-EXCITED CARRIERS IN SILICON [J].
BETZLER, K .
SOLID STATE COMMUNICATIONS, 1974, 15 (11-1) :1837-1840
[6]   ELECTRICAL PROPERTIES OF HEAVILY DOPED SILICON [J].
CHAPMAN, PW ;
TUFTE, ON ;
ZOOK, JD ;
LONG, D .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (11) :3291-&
[7]   PHOTO-LUMINESCENCE TECHNIQUE FOR THE DETERMINATION OF MINORITY-CARRIER DIFFUSION LENGTH IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DUGGAN, G ;
SCOTT, GB ;
FOXON, CT ;
HARRIS, JJ .
APPLIED PHYSICS LETTERS, 1981, 38 (04) :246-248
[8]  
DUTTA NK, 1981, APPL PHYS LETT, V38, P407, DOI 10.1063/1.92380
[9]   THE CASE FOR AUGER RECOMBINATION IN IN1-XGAXASYP1-Y [J].
DUTTA, NK ;
NELSON, RJ .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :74-92
[10]   A PHYSICAL MODEL FOR THE DEPENDENCE OF CARRIER LIFETIME ON DOPING DENSITY IN NONDEGENERATE SILICON [J].
FOSSUM, JG ;
LEE, DS .
SOLID-STATE ELECTRONICS, 1982, 25 (08) :741-747