CHARACTERIZATION OF TUNGSTEN FILMS DEPOSITED BY SILICON REDUCTION OF TUNGSTEN HEXAFLUORIDE

被引：0
作者：
PAULEAU, Y
LAMI, P
DASSAPA, F
ROMAGNA, F
OBERLIN, JC
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来源：
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 1987年 / 42卷 / 236期
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中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
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页码：163 / 165
页数：3
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