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- [1] COMPOSITION OF TUNGSTEN SILICIDE FILMS DEPOSITED BY DICHLOROSILANE REDUCTION OF TUNGSTEN HEXAFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (09) : 2955 - 2959HARA, TMIYAMOTO, THAGIWARA, HBROMLEY, EIHARSHBARGER, WR
- [2] NUCLEATION AND GROWTH OF TUNGSTEN FILMS PRODUCED BY THE SILICON REDUCTION OF TUNGSTEN HEXAFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C313 - C314GREEN, MLALI, YSBOONE, TDAVIDSON, BAFELDMAN, LCNAKAHARA, S
- [3] SELECTIVE DEPOSITION OF TUNGSTEN FILMS BY REDUCTION OF TUNGSTEN HEXAFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C477 - C477LAMI, PPAULEAU, Y
- [4] COMPARISON OF THE DIFFUSION BARRIER PROPERTIES OF TUNGSTEN FILMS PREPARED BY HYDROGEN AND SILICON REDUCTION OF TUNGSTEN HEXAFLUORIDETHIN SOLID FILMS, 1989, 171 (02) : 343 - 357THOMAS, OCHARAI, ADHEURLE, FMFINSTAD, TGJOSHI, RV
- [5] STEP COVERAGE OF TUNGSTEN SILICIDE FILMS DEPOSITED BY LOW-PRESSURE DICHLOROSILANE REDUCTION OF TUNGSTEN HEXAFLUORIDETHIN SOLID FILMS, 1990, 193 (1-2) : 234 - 243RAUPP, GBCALE, TSJAIN, MKROGERS, BSRINIVAS, D
- [6] THE EFFECTS OF CHEMICAL OXIDE ON THE DEPOSITION OF TUNGSTEN BY THE SILICON REDUCTION OF TUNGSTEN HEXAFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (09) : 2339 - 2345WONG, MKOBAYASHI, NBROWNING, RPAINE, DSARASWAT, KC
- [7] THE EFFECTS OF CHEMICAL OXIDE ON THE DEPOSITION OF TUNGSTEN BY THE SILICON REDUCTION OF TUNGSTEN HEXAFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C477 - C477WONG, MKOBAYASHI, NBROWNING, RPAINE, DSARASWAT, KC
- [8] RBS AND SIMS CHARACTERIZATION OF TUNGSTEN SILICIDE DEPOSITED BY USING DICHLOROSILANE AND TUNGSTEN HEXAFLUORIDESURFACE AND INTERFACE ANALYSIS, 1989, 14 (1-2) : 13 - 17GREGORY, RBWU, THTTOMPKINS, HGLAMARTINE, BC
- [9] GROWTH-KINETICS AND INHIBITION OF GROWTH OF CHEMICAL VAPOR-DEPOSITED THIN TUNGSTEN FILMS ON SILICON FROM TUNGSTEN HEXAFLUORIDEJOURNAL OF APPLIED PHYSICS, 1992, 72 (02) : 490 - 498LEUSINK, GJKLEIJN, CROOSTERLAKEN, TGMJANSSEN, GCAMRADELAAR, S
- [10] CHARACTERIZATION OF ELECTRON-BEAM DEPOSITED TUNGSTEN FILMS ON SAPPHIRE AND SILICONJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2289 - 2292SOUK, JHOHANLON, JFANGILLELO, J