PHOTOVOLTAGE ON SILICON SURFACES MEASURED BY SCANNING TUNNELING MICROSCOPY

被引:34
作者
KUK, Y
BECKER, RS
SILVERMAN, PJ
KOCHANSKI, GP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 02期
关键词
D O I
10.1116/1.585565
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface bias voltages induced on a scanning tunnel microscope (STM) junction illuminated with laser radiation are spatially resolved for silicon surfaces. Surface photovoltages of approximately 0.3 V for Si(111)-(7 x 7) and < 0.1 V for Si(001)-(2 x 1) are observed with large reductions in the vicinity of surface/subsurface defects associated with midgap states. These reductions, attributed to a variation in the recombination rate, have typical surface screening lengths that are less than those found in the bulk. A small, atomically varying signal of 3-5 mV is also observed and is due to spatial variations in rectification efficiency rather than photovoltage.
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页码:545 / 550
页数:6
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