TITANIUM NITRIDE-MOLYBDENUM METALLIZING METHOD FOR ALUMINUM NITRIDE

被引:11
作者
ASAI, H
UENO, F
IWASE, N
SATO, H
MIZUNOYA, N
KIMURA, T
ENDO, K
TAKAHASHI, T
SUGIURA, Y
机构
[1] TOSHIBA CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
[2] TOSHIBA CO LTD,DIV DISCRETE SEMICOND ENGN,SEMICOND GRP,KAWASAKI 210,JAPAN
来源
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1990年 / 13卷 / 02期
关键词
D O I
10.1109/33.56185
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A paste containing molybdenum (Mo) and titanium nitride (TiN) powders was printed on aluminum nitride (AlN) substrates and post-fired. An adhesion strength of metallized substrates with Ni/Au plate was about 25 kgf/2.5 mm and was unchanged after the thermal cycle test. TiN-Mo does not adhere to the grain boundary phase in AlN substrate, nor to surface oxide layer, but to the AlN grain itself. This method, therefore, seems to be applicable to any kind of AlN substrate, which may have different grain boundary oxide phases and thermal conductivities. This TiN-Mo metallized AlN substrate was tried as a replacement for a beryllium oxide (BeO) heat sink, which has been used for RF power transistors. There was no trouble in assembling the AlN heat sinks into transistors. Thermal resistance and electrical properties for transistors with AlN heat sinks were almost equal to those with BeO heat sinks. The TiN-Mo metallized AlN substrates were found to be suitable replacement BeO substrates as the heat sinks for semiconductor devices. © 1990 IEEE
引用
收藏
页码:457 / 461
页数:5
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