THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE

被引：90
作者：
AITA, CR
PURDES, AJ
LAD, RJ
FUNKENBUSCH, PD
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 10期
关键词：
D O I：
10.1063/1.327472
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：5533 / 5536
页数：4
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共 34 条
[1]   PREPARATION AND PROPERTIES OF THIN-FILMS OF ZNO FOR HYPERSONIC TRANSDUCERS [J].
CHERNETS, AN ;
KENIGSBERG, NL .
THIN SOLID FILMS, 1973, 18 (02) :247-255
[2]  
Coburn J. W., 1974, Japanese Journal of Applied Physics, P501
[3]   PLASMA DIAGNOSTICS OF AN RF-SPUTTERING GLOW DISCHARGE [J].
COBURN, JW ;
KAY, E .
APPLIED PHYSICS LETTERS, 1971, 18 (10) :435-&
[4]   POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING [J].
COBURN, JW ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) :4965-4971
[5]   GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS [J].
COBURN, JW ;
TAGLAUER, E ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1779-1786
[6]   MASS-SPECTROMETRIC STUDY OF NEUTRAL-SPUTTERED SPECIES IN AN RF GLOW-DISCHARGE SPUTTERING SYSTEM [J].
COBURN, JW ;
ECKSTEIN, EW ;
KAY, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :151-154
[7]   A SYSTEM FOR DETERMINING MASS ENERGY OF PARTICLES INCIDENT ON A SUBSTRATE IN A PLANAR DIODE SPUTTERING SYSTEM [J].
COBURN, JW .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1970, 41 (08) :1219-&
[8]   DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J].
DAVIDSE, PD ;
MAISSEL, LI .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :574-&
[9]   C-AXIS ORIENTATION OF SPUTTERED ZNO FILMS [J].
DYBWAD, GL .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) :5192-&
[10]   CRYSTALLOGRAPHIC ORIENTATION OF ZINC OXIDE FILMS DEPOSITED BY TRIODE SPUTTERING [J].
FOSTER, NF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :111-&
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