STRUCTURAL STUDY OF AG OVERLAYERS DEPOSITED ON A SI(111) SUBSTRATE BY IMPACT-COLLISION ION-SCATTERING-SPECTROSCOPY WITH TIME-OF-FLIGHT DETECTION

被引:27
作者
SUMITOMO, K
TANAKA, K
IZAWA, Y
KATAYAMA, I
SHOJI, F
OURA, K
HANAWA, T
机构
[1] Electron Beam Laboratory, Faculty of Engineering, Osaka University, Suita, Osaka
关键词
D O I
10.1016/0169-4332(89)90042-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using the technique of time-of-flight mode impact-collision ion-scattering-spectroscopy, we have studied the structure of two kinds of Ag thin films deposited onto Si(111)7×7 substrates. We have shown that (1) the RT deposited Ag thin film of 10 ML thickness consists of type-A and type-B domains of Ag(111), with type-B being rotated 180° about the surface normal, (2) the experimental ICISS angle scans for the Si(111)√3×√3R30°-Ag surface cannot be explained by the embedded-Ag model proposed so far, (3) the Ag honeycomb structure residing on top of Si is unlikely for the √3 × √3-Ag surface, and (4) both the Ag-trimer and the HCT model, residing on top of Si are more likely, though a clear preference between these two models has not been obtained as yet. © 1989.
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页码:112 / 117
页数:6
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