VOLTAMMETRIC STUDIES OF TANTALUM ELECTRODEPOSITION BATHS

被引：57

作者：

CHAMELOT, P ^{[1
]}

TAXIL, P ^{[1
]}

LAFAGE, B ^{[1
]}

机构：

[1] UNIV TOULOUSE 3,GENIE CHIM & ELECTROCHIM LAB,CNRS,URA 192,118 ROUTE NARBONNE,F-31062 TOULOUSE,FRANCE

来源：

ELECTROCHIMICA ACTA | 1994年 / 39卷 / 17期

关键词：

TANTALUM; ELECTRODEPOSITION; MOLTEN FLUORIDES; POTASSIUM HEPTAFLUOROTANTALATE; SQUARE WAVE VOLTAMMETRY;

D O I：

10.1016/0013-4686(94)00262-2

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Deposits of tantalum were prepared at 780-degrees-C by reduction of K2TaF7, the solvent being a eutectic LiF-NaF mixture. Cyclic voltammetry and square-wave voltammetry were used to demonstrate the competition exerted on the reduction of the TaF7(2-) ions leading to deposition of tantalum oxide by reduction of the tantalum oxyfluoride ions [TaOF(n)(n-3), probably with n = 5]. The use of square-wave voltammetry enabled the attribution of a peak to each of the reactions and, from the peak current produced by TaF7(2-) its calibration curve to be established. This curve was used in monitoring the level of TaF7(2-) during the deposition process.

引用

页码：2571 / 2575

页数：5

共 31 条

[1]

AMOSOV VM, 1965, IZV VUZOV TSVET MET, V1, P110

[2]

BAKER GC, 1958, ANAL CHIM ACTA, V18, P118

[3]

BARKER GC, 1960, Z ANAL CHEM, V173, P79

[4] DIFFERENTIAL NORMAL PULSE VOLTAMMETRY IN THE ALTERNATING PULSE MODE FOR REVERSIBLE ELECTRODE-REACTIONS [J].