INVESTIGATION OF VOIDS DISTRIBUTION IN AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS BY POSITRON-ANNIHILATION AND THERMAL GAS EVOLUTION EXPERIMENTS

被引：17
作者：
FREIRE, FL
ACHETE, CA
BRUSA, RS
MARIOTTO, G
TENG, XT
ZECCA, A
机构：
[1] FED UNIV RIO DE JANEIRO,COPPE,PROGRAMA ENGN MET & MAT,BR-21910 RIO JANEIRO,BRAZIL
[2] UNIV TRENT,DIPARTIMENTO FIS,I-38050 TRENT,ITALY
来源：
SOLID STATE COMMUNICATIONS | 1994年 / 91卷 / 12期
关键词：
A THIN FILMS; C POINTS DEFECTS; D MECHANICAL PROPERTIES;
D O I：
10.1016/0038-1098(94)90434-0
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
An investigation of the voids distribution in hard amorphous carbon nitride films (a-CNx:H) and carbon (a-C:H) films deposited by self-bias glow-discharge was carried out by means of thermal gas evolution analysis and positron annihilation spectroscopy. Internal stress measurements were also performed. Our results for the carbon nitride films indicate a clear correlation between the noticeable reduction of the internal stress of the films and the increase of the voids concentration. The concentration of voids increases with the amount of incorporated nitrogen.
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页码：965 / 970
页数：6
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