HIGH-RATE DEPOSITION OF TITANIUM SILICIDES UNDER HIGH GAS-FLOW RATE BY CHEMICAL-VAPOR-DEPOSITION

被引：4
|
作者：
KAWAI, C
机构：
[1] Itami Research Laboratories, Sumitomo Electric Industries, Ltd, Itami, Hyogo, 664
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1994年 / 13卷 / 12期
关键词：
D O I：
10.1007/BF00273230
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：860 / 862
页数：3
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