EPITAXIAL-GROWTH OF BAMGF4 FILMS ON SI(100) AND (111) SUBSTRATES - AN APPROACH TO FERROELECTRIC SEMICONDUCTOR HETEROSTRUCTURES

被引:14
作者
AIZAWA, K [1 ]
ISHIWARA, H [1 ]
KUMAGAI, M [1 ]
机构
[1] KANAGAWA HIGH TECHNOL FDN,MAT CHARACTERIZAT LAB,TAKATSU KU,KAWASAKI 213,JAPAN
关键词
D O I
10.1063/1.110681
中图分类号
O59 [应用物理学];
学科分类号
摘要
Growth of BaMgF4 films on both Si(100) and (111) substrates has been attempted using molecular beam epitaxy. (011) - and (120)-oriented epitaxial films are successfully grown at temperatures approximately 500-degrees-C on Si (100) and (111) substrates, respectively. It has been found that the best channeling minimum yield in Rutherford backscattering spectrometry is about 0.55 for a BaMgF4(120) film on Si(111), and that the films are composed of crystallites whose orientations reflect the substrate symmetry.
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页码:1765 / 1767
页数:3
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