FACTORS AFFECTING GROWTH RATE OF PLASMA ANODIZED AL203

被引：20

作者：

OHANLON, JF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1971年 / 118卷 / 02期

关键词：

D O I：

10.1149/1.2407996

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：270 / &

共 10 条

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