X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION ON THE CHEMICAL-STRUCTURE OF AMORPHOUS-SILICON NITRIDE (A-SINX)

被引：128
作者：
INGO, GM
ZACCHETTI, N
DELLASALA, D
COLUZZA, C
机构：
[1] ENIRICERCHE SPA,I-00015 ROME,ITALY
[2] UNIV LA SAPIENZA,DIPARTIMENTO FIS,I-00185 ROME,ITALY
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期
关键词：
D O I：
10.1116/1.576314
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：3048 / 3055
页数：8
相关论文
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