CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE ON PLASMA NITRIDED STEEL

被引：8
|
作者：
WELLS, A
YATES, SC
机构：
[1] CSIR, Pretoria, S Afr, CSIR, Pretoria, S Afr
来源：
JOURNAL OF MATERIALS SCIENCE | 1988年 / 23卷 / 04期
关键词：
STEEL - Protective Coatings - STEEL HEAT TREATMENT - Nitriding;
D O I：
10.1007/BF01154620
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Ferritic and austenitic nitriding by the plasma nitriding technique were investigated for the modification of steel substrates prior to the chemical vapor deposition of titanium nitride at 1273 K. It is confirmed that prenitriding enhances the growth of the titanium nitride layer. A TiN coating can be formed using substrate derived nirogen only. Control of porosity arising during austenitic nitriding was investigated.
引用
收藏
页码：1481 / 1485
页数：5
相关论文
共 50 条
  • [21] REMOTE PLASMA CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE FILMS
    ALEXANDROV, SE
    KOVALGIN, AY
    JOURNAL DE PHYSIQUE IV, 1991, 1 (C2): : 847 - 847
  • [22] CHEMICAL VAPOR-DEPOSITION OF TITANIUM, ZIRCONIUM, AND HAFNIUM NITRIDE THIN-FILMS
    FIX, R
    GORDON, RG
    HOFFMAN, DM
    CHEMISTRY OF MATERIALS, 1991, 3 (06) : 1138 - 1148
  • [23] KINETIC-STUDIES OF LASER-CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE
    CHEN, XL
    MAZUMDER, J
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (06) : 3914 - 3916
  • [24] STUDY OF THE CHEMICAL-COMPOSITION OF SILICON-NITRIDE FILMS OBTAINED BY CHEMICAL VAPOR-DEPOSITION AND PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    OLIVERI, C
    BAROETTO, F
    MAGRO, C
    SURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3): : 137 - 146
  • [25] CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE
    BUHLER, J
    FITZER, E
    KEHRE, D
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C299 - C299
  • [26] CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE
    GEBHARDT, JJ
    TANZILLI, RA
    HARRIS, TA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) : 1578 - 1582
  • [27] CHEMICAL VAPOR-DEPOSITION OF BORON-NITRIDE
    PATIBANDLA, N
    LUTHRA, KL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (12) : 3558 - 3565
  • [28] CHEMICAL VAPOR-DEPOSITION OF TANTALUM NITRIDE FILMS
    TAKAHASHI, T
    ITOH, H
    OZEKI, S
    JOURNAL OF THE LESS-COMMON METALS, 1977, 52 (01): : 29 - 36
  • [29] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION WITH TITANIUM AMIDES AS PRECURSORS
    STOCK, HR
    BERNDT, H
    MAYR, P
    SURFACE & COATINGS TECHNOLOGY, 1991, 46 (01): : 15 - 23
  • [30] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE IN A CAPACITIVELY COUPLED RADIO-FREQUENCY DISCHARGE
    LAIMER, J
    STORI, H
    RODHAMMER, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (05): : 2952 - 2959
12345